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William Sharp (lithographer) William Sharp (1803–1875) was a British-born painter who is credited with introducing chromolithography to America in 1840. [1] Sharp had worked for the lithographer Charles Hullmandel in London. On his arrival in Boston in 1840, Sharp became partners with Francis Michelin, another former employee of Hullmandel.
Joseph Britton (1825 – July 18, 1901) was a lithographer, the co-founder of prominent San Francisco lithography studio Britton and Rey, and a civic leader in San Francisco, serving as a member of the Board of Supervisors and helping to draft a new city charter . Britton was born in Yorkshire, England, and at age 10 immigrated to New York City ...
EUV-Lithografie (auch kurz EUVL) ist ein Fotolithografie -Verfahren, das elektromagnetische Strahlung mit einer Wellenlänge von 13,5 nm (91,82 eV) nutzt, sogenannte extrem ultraviolette Strahlung ( englisch extreme ultra violet, EUV). EUV-Lithografie ermöglicht es, nach Ausreizen bisheriger Belichtungsmethoden die Strukturverkleinerung in der ...
In addition to being a lithographer, he was also a New York City volunteer fireman in the 1850s. He was a Unitarian. Currier was a friend of P.T. Barnum of Barnum and Bailey fame. Currier was fond of fast horses and kept several at a barn in his Massachusetts residence, which he purchased, ordered dismantled, and had delivered by horse to his ...
An interference pattern between two or more coherent light waves is set up and recorded in a recording layer ( photoresist ). This interference pattern consists of a periodic series of fringes representing intensity minima and maxima. Upon post-exposure photolithographic processing, a photoresist pattern corresponding to the periodic intensity ...
Maskless lithography. Maskless lithography ( MPL) is a photomask -less photolithography -like technology used to project or focal-spot write the image pattern onto a chemical resist-coated substrate (e.g. wafer) by means of UV radiation or electron beam. [1]
1 de fev. de 2010 · A thermal roller imprint lithography (RIL) system was developed and applied to RIL tests to evaluate its feasibility for the large area replication of an optical micro device. The system has the capacity to replicate ultra-precision structures on an area of 100mm×100mm at the scanning speed range of 0.1–10 mm/s.
